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About this Engineering article
Annealing effect in DC and RF sputtered ITO thin films by Kerkache, L.; Layadi, A.; Dogheche, E.; Rémiens, D. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kerkache, L.; Layadi, A.; Dogheche, E.; Rémiens, D.
- Publisher
- EDP Sciences (ISSN 1286-0042)
- Published
- 2007
- Field
- Engineering (Physical Sciences)
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