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About this Engineering article
Utilizing the superior etch stop quality of HfO2 in the front end of line wafer scale integration of silicon nanowire biosensors by Jayakumar, G.; Hellström, P.-E.; Östling, M. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Jayakumar, G.; Hellström, P.-E.; Östling, M.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2019
- Field
- Engineering (Physical Sciences)