A New Technique of Boron Doping in Si:H Films

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Published1981

About this book

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Published by Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922) (1981).

Publisher: Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)

About this Engineering article

A New Technique of Boron Doping in Si:H Films by T. Hamasaki; H. Kurata; M. Hirose; Y. Osaka is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author

T. Hamasaki; H. Kurata; M. Hirose; Y. Osaka

Publisher

Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)

Published

1981

Field

Engineering (Physical Sciences)