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About this Engineering article
Relationships between Optimal Exposure Characteristics of Photographic Materials by Farnell, G.C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Farnell, G.C.
- Publisher
- Informa UK (Taylor & Francis); Royal Photographic Society of Great Britain; Informa UK Limited (ISSN 0022-3638)
- Published
- 1958
- Field
- Engineering (Physical Sciences)