About this scholarly article

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Characterization of line-edge roughness in Cu/low- k interconnect pattern by Yamaguchi, Atsuko; Archie, Chas N.; Ryuzaki, Daisuke; Yamamoto, Jiro; Kawada, Hiroki; Iizumi, Takashi is a scholarly article available to read on EtoBox.

Author

Yamaguchi, Atsuko; Archie, Chas N.; Ryuzaki, Daisuke; Yamamoto, Jiro; Kawada, Hiroki; Iizumi, Takashi

Publisher

SPIE

Published

2007

Language

EN