About this scholarly article

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII - Lithography Wand-Fabrication And Applications Of Novel Microstructures For Electron And Ion Beam Nanometer Lithography by Jones, Gary W.; Jones, Susan K.; Dudley, Bruce W.; Walters, Mark D.; Yanof, Arnold W. is a scholarly article available to read on EtoBox.

Author

Jones, Gary W.; Jones, Susan K.; Dudley, Bruce W.; Walters, Mark D.; Yanof, Arnold W.

Publisher

SPIE

Published

1989

Language

EN