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UV laser microprocessing and post chemical etching on ultrathin Al2O3 ceramic substrate by Fei Zhang; Jun Duan; Xiaoyan Zeng; Yu Cao is a Materials Science article available to read on EtoBox.

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In this study, an Nd:YVO 4 UV laser was used for microprocessing ultrathin (125 m) ceramic plates for use as a multi-layer microchip substrate. The effects of the UV laser microprocessing parameters, including laser power density, frequency, laser scanning speed, and pass delay on microprocessing accuracy and quality (kerf width and arithmetic average roughness R a on the kerf sidewall) were investigated by means of a 4 × 4 orthogonal design. The key processing parameters were determined and optimized for small kerf width and minimal R a of the kerf sidewall while retaining high production efficiency. Subsequent chemical etching of the laser processed areas was performed to reduce the kerf surface and kerf sidewall roughness by removing debris and the thin recast layer for the required size precision and post gilding treatment. The results showed that a clean surface and crack-free kerf sidewall with roughness R a of 0.16 m could be achieved by laser microprocessing and chemical etching.

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Author

Fei Zhang; Jun Duan; Xiaoyan Zeng; Yu Cao

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0955-2219)

Published

2011

Language

EN

Field

Materials Science (Physical Sciences)