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About this Engineering article
Fluorine Passivation of Metal Surface for Self-cleaning Semiconductor Equipment by Miki, N.; Maeno, M.; Maruhashi, K.; Nakagawa, Y.; Ohmi, T. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Miki, N.; Maeno, M.; Maruhashi, K.; Nakagawa, Y.; Ohmi, T.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0894-6507)
- Published
- 1990
- Field
- Engineering (Physical Sciences)
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