About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Development of a technique for rapid at-wavelength inspection of EUV mask blanks by Spector, Steven J.; Luo, Ping; Novembre, Anthony E.; Ocola, Leonidas E.; White, Donald L.; Tennant, Donald M.; Wood II, Obert R.; Vladimirsky, Yuli is a scholarly article available to read on EtoBox.

Author

Spector, Steven J.; Luo, Ping; Novembre, Anthony E.; Ocola, Leonidas E.; White, Donald L.; Tennant, Donald M.; Wood II, Obert R.; Vladimirsky, Yuli

Publisher

SPIE

Published

1999