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Root Cause Analysis and Correction of Single Metal Contact Open-Induced Scan Chain Failure in 90nm node VLSI by Ting, Chao-Cheng; Liu, Ya-Chi; Chen, Hsuan-Hsien; Tsai, Chung-Ching; Shih, Liwen is a scholarly article available to read on EtoBox.

What is Root Cause Analysis and Correction of Single Metal Contact Open-Induced Scan Chain Failure in 90nm node VLSI about?

In this paper, the localization of open metal contact for 90nm node SOC is reported based on Electron Beam Absorbed Current (EBAC) technique and scan diagnosis for the first time. According to the detected excess carbon, silicon and oxygen signals obtained from X-ray energy dispersive spectroscopy (EDX), the failure was deemed to be caused by the incomplete removal of silicate photoresist polymer formed during the O2 plasma dry clean before copper plating. Based on this, we proposed to replace the dry clean with diluted HF clean prior to the copper plating, which can significantly remove the silicate polymers and increase the yield.

Author

Ting, Chao-Cheng; Liu, Ya-Chi; Chen, Hsuan-Hsien; Tsai, Chung-Ching; Shih, Liwen

Published

2018

Language

EN