About this scholarly article

2015 IEEE International Reliability Physics Symposium - Negative bias temperature instability caused by plasma induced damage in 65 nm bulk and Silicon on thin BOX (SOTB) processes by Kishida, Ryo; Oshima, Azusa; Kobayashi, Kazutoshi is a scholarly article available to read on EtoBox.

Author

Kishida, Ryo; Oshima, Azusa; Kobayashi, Kazutoshi

Publisher

IEEE

Published

2015