About this scholarly article

2005 International Semiconductor Device Research Symposium - High Mobility Strained Ge MOSFETs with high-k gate dielectric on Si by Donnelly, J.P.; Kelly, D.Q.; Joshi, S.; Dey, S.; Shahrjerdi, D.; Wiedeman, I.; Ahmad, D.; Banerjee, S.K. is a scholarly article available to read on EtoBox.

Author

Donnelly, J.P.; Kelly, D.Q.; Joshi, S.; Dey, S.; Shahrjerdi, D.; Wiedeman, I.; Ahmad, D.; Banerjee, S.K.

Publisher

IEEE

Published

2005

Language

EN