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About this Engineering article
Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition by G. Sánchez; A. Wu; P. Tristant; C. Tixier; B. Soulestin; J. Desmaison; A. Bologna Alles is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- G. Sánchez; A. Wu; P. Tristant; C. Tixier; B. Soulestin; J. Desmaison; A. Bologna Alles
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2008
- Field
- Engineering (Physical Sciences)