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About this Engineering article
Etching characteristics of high-k dielectric HfO[sub 2] thin films in inductively coupled fluorocarbon plasmas by Takahashi, Kazuo; Ono, Kouichi; Setsuhara, Yuichi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Takahashi, Kazuo; Ono, Kouichi; Setsuhara, Yuichi
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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