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Can I read Influence of substrate properties on the growth of titanium films: part III on EtoBox?
Influence of substrate properties on the growth of titanium films: part III by P. Oberhauser; R. Abermann is a Engineering article available to read on EtoBox.
What is Influence of substrate properties on the growth of titanium films: part III about?
The growth of thin Ti-oxide ®lms (12 nm) on alumina substrate ®lms formed by reactive evaporation of Ti in an oxygen atmosphere was studied by in situ internal stress measurements under ultra high vacuum conditions and transmission electron microscopy. Oxygen pressure and substrate temperatures were the varied parameters of the reactive evaporation. These Ti-oxide-®lms with different oxygen content (O 2 / Ti-®lms) were then used as substrate ®lms for the deposition of a clean titanium ®lm. The growth stress of the titanium ®lm on the asdeposited O 2 /Ti-substrate ®lms is comparable with that previously found for H 2 O/Ti-substrates and indicates island growth and the formation of polycrystalline titanium ®lms. Annealing (4008C, 20 min) of the as-deposited ± amorphous ± O 2 /Ti-®lms gives rise to the formation of crystalline TiO 2 . The amount of TiO 2 formed during annealing is strongly dependent on the oxygen content of the O 2 /Ti-®lm. The oxygen content, in return, is dependent on oxygen partial pressure and substrate temperature during O 2 /Ti-®lm deposition. The corresponding changes in the substrate ®lm properties (oxygen content, crystallinity, etc.) are re ̄ected in signi®c
Who reads Influence of substrate properties on the growth of titanium films: part III?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P. Oberhauser; R. Abermann
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)