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About this Engineering article
Effect of mechanical stress for thin SiO2 films in TDDB and CCST characteristics : Y. Ohno, A. Ohsaki, T. Kaneoka, J. Mitsuhashi, M. Hirayama and T. Kato. 27th a. Proc. IEEE/IRPS Int. Reliab. Phys. Symp., 34 (1989) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1990
- Field
- Engineering (Physical Sciences)