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About this Engineering article
Threshold concentration for ion implantation-induced Co nanocluster formation in TiO2:Co thin films by Yıldırım, O.; Cornelius, S.; Smekhova, A.; Butterling, M.; Anwand, W.; Wagner, A.; Bähtz, C.; Böttger, R.; Potzger, K. is a Engineering article available to read on EtoBox.
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- Author
- Yıldırım, O.; Cornelius, S.; Smekhova, A.; Butterling, M.; Anwand, W.; Wagner, A.; Bähtz, C.; Böttger, R.; Potzger, K.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0168-583X)
- Published
- 2016
- Language
- EN
- Field
- Engineering (Physical Sciences)