About this Engineering article
Erratum: Silicon dioxide fine patterning by reactive fast atom beam etching [J. Vac. Sci. Technol. B 6, 1565 (1988)] by H. Kuwano is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- H. Kuwano
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1990
- Language
- EN
- Field
- Engineering (Physical Sciences)