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SPIE Proceedings [SPIE 19th European Conference on Mask Technology for Integrated Circuits and Microcomponts - Sonthofen, Germany (Monday 13 January 2003)] 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool by Scheuring, Gerd; Petrashenko, Alexander; Doebereiner, Stefan; Hillmann, Frank; Bruck, Hans-Jurgen; Hourd, Andrew C.; Grimshaw, Anthony; Hughes, Gordon; Chen, Shiuh-Bin; Chen, Parkson W.; Schatz, Thomas; Struck, Thomas; van Adrichem, Paul J. M.; Boerland, Herman; Lehnigk, Sigrid; Behringer, Uwe F. W. is a scholarly article available to read on EtoBox.

Author
Scheuring, Gerd; Petrashenko, Alexander; Doebereiner, Stefan; Hillmann, Frank; Bruck, Hans-Jurgen; Hourd, Andrew C.; Grimshaw, Anthony; Hughes, Gordon; Chen, Shiuh-Bin; Chen, Parkson W.; Schatz, Thomas; Struck, Thomas; van Adrichem, Paul J. M.; Boerland, Herman; Lehnigk, Sigrid; Behringer, Uwe F. W.
Publisher
SPIE
Published
2003
Language
EN

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