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Mechanistic study of partial oxidation of methane to synthesis gas over supported rhodium and ruthenium catalysts using in situ time-resolved FTIR spectroscopy by Wei Zheng Weng; Ming Shu Chen; Qian Gu Yan; Ting Hua Wu; Zi Sheng Chao; Yuan Yan Liao; Hui Lin Wan is a Materials Science article available to read on EtoBox.
What is Mechanistic study of partial oxidation of methane to synthesis gas over supported rhodium and ruthenium catalysts using in situ time-resolved FTIR spectroscopy about?
In situ time-resolved FTIR spectroscopy was used to study the reaction mechanism of partial oxidation of methane to synthesis gas and the interaction of CH 4 /O 2 /He (2/1/45) gas mixture with adsorbed CO species over SiO 2 and ␥-Al 2 O 3 supported Rh and Ru catalysts at 500-600 • C. It was found that CO is the primary product for the reaction of CH 4 /O 2 /He (2/1/45) gas mixture over H 2 reduced and working state Rh/SiO 2 catalyst. Direct oxidation of methane is the main pathway of synthesis gas formation over Rh/SiO 2 catalyst. CO 2 is the primary product for the reaction of CH 4 /O 2 /He (2/1/45) gas mixture over Ru/␥-Al 2 O 3 and Ru/SiO 2 catalysts. The dominant reaction pathway of CO formation over Ru/␥-Al 2 O 3 and Ru/SiO 2 catalysts is via the reforming reactions of CH 4 with CO 2 and H 2 O. The effect of space velocity on the partial oxidation of methane over SiO 2 and ␥-Al 2 O 3 supported Rh and Ru catalysts is consistent with the above mechanisms. It is also found that consecutive oxidation of surface CO species is an important pathway of CO 2 formation during the partial oxidation of methane to synthesis gas over Rh/SiO 2 and Ru/␥-Al 2 O 3 catalysts.
Who reads Mechanistic study of partial oxidation of methane to synthesis gas over supported rhodium and ruthenium catalysts using in situ time-resolved FTIR spectroscopy?
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Wei Zheng Weng; Ming Shu Chen; Qian Gu Yan; Ting Hua Wu; Zi Sheng Chao; Yuan Yan Liao; Hui Lin Wan
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0920-5861)
- Published
- 2000
- Language
- EN
- Field
- Materials Science (Physical Sciences)