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Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation by Chen Chung Chen; Kuo-Feng Chiu; Kun Ming Lin; Hsin Chih Lin is a Engineering article available to read on EtoBox.
What is Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation about?
Lithium manganese oxides have been deposited by radio frequency magnetron sputter deposition with relatively lower annealing temperatures and then post-treated with a radio frequency (rf) driven oxygen plasma. Following oxygen plasma irradiation, the film properties were modified, and the performance of the thin film cathode has been enhanced. The electrochemical properties of the treated thin-film cathodes were characterized and compared. The results showed that the samples with moderate plasma treatment also maintained good cyclic properties as cycled at a wide range potential window of 2.0 V-4.5 V. Its electrochemical properties were significantly improved by this process, even though the films were prepared under low annealing temperature.
Who reads Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chen Chung Chen; Kuo-Feng Chiu; Kun Ming Lin; Hsin Chih Lin
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)
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