About this Engineering article
N2 effect on GaAs etching at 150 mTorr capacitively-coupled Cl2/N2 plasma by Y.H. Park; J.K. Kim; J.H. Lee; Y.W. Joo; H.S. Noh; J.W. Lee; S.J. Pearton is a Engineering article available to read on EtoBox.
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- Author
- Y.H. Park; J.K. Kim; J.H. Lee; Y.W. Joo; H.S. Noh; J.W. Lee; S.J. Pearton
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2010
- Language
- EN
- Field
- Engineering (Physical Sciences)