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Can I read New developments on the Surrey microbeam applications to lithography on EtoBox?
New developments on the Surrey microbeam applications to lithography by P. Mistry; I. Gomez-Morilla; G.W. Grime; R. Webb; C. Jeynes; R. Gwilliam; A. Cansell; M. Merchant; K.J. Kirkby is a Engineering article available to read on EtoBox.
What is New developments on the Surrey microbeam applications to lithography about?
Investigations using MeV protons for lithography applications are being performed at the Ion Beam Centre of the University of Surrey, UK. High aspect ratio three dimensional structures have been produced by protons in gallium arsenide (GaAs) and Poly(methyl methacrylate) (PMMA). Structures produced in PMMA require significantly lower fluences than GaAs and behave positively to etching, whereas GaAs shows a negative behaviour. Variable fluence studies on GaAs show a transition from low to high aspect ratio three dimensional structures as the fluence increases.
Who reads New developments on the Surrey microbeam applications to lithography?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P. Mistry; I. Gomez-Morilla; G.W. Grime; R. Webb; C. Jeynes; R. Gwilliam; A. Cansell; M. Merchant; K.J. Kirkby
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0168-583X)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)