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About this Engineering article
Study of the uniformity and stoichiometry of CoSi2 films using Rutherford backscattering spectroscopy and scanning electron microscopy by Ishibashi, Kouichirou is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ishibashi, Kouichirou
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1983
- Field
- Engineering (Physical Sciences)