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Can I read Plasma Etching: An Introduction (Plasma : Materials Interactions) (Plasma : Materials Interactions) on EtoBox?

Plasma Etching: An Introduction (Plasma : Materials Interactions) (Plasma : Materials Interactions) by Dennis M. Manos and Daniel L. Flamm (Eds.) is a nonfiction available to read on EtoBox.

What is Plasma Etching: An Introduction (Plasma : Materials Interactions) (Plasma : Materials Interactions) about?

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

Who reads Plasma Etching: An Introduction (Plasma : Materials Interactions) (Plasma : Materials Interactions)?

It is typically read by self-directed learners exploring a subject in depth.

Common subject areas: history, science, philosophy, social sciences.

Author
Dennis M. Manos and Daniel L. Flamm (Eds.)
Publisher
Academic Press, Incorporated
Published
1989
Language
EN
ISBN
9780124693708
Category
nonfiction
Subjects
Science, Technology, Chemistry

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