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Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties by Dong, Xiang (author);Su, Yuanjie (author);Wu, Zhiming (author);Xu, Xiangdong (author);Xiang, Zihao (author);Shi, Yuanlin (author);Chen, Wenyu (author);Dai, Jinhong (author);Huang, Zhangying (author);Wang, Tao (author);Jiang, Yadong (author) is a Materials Science article available to read on EtoBox.

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Author
Dong, Xiang (author);Su, Yuanjie (author);Wu, Zhiming (author);Xu, Xiangdong (author);Xiang, Zihao (author);Shi, Yuanlin (author);Chen, Wenyu (author);Dai, Jinhong (author);Huang, Zhangying (author);Wang, Tao (author);Jiang, Yadong (author)
Publisher
Elsevier BV
Published
2021
Field
Materials Science (Physical Sciences)

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