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About this Engineering article

High-performance Polycrystalline Silicon Thin-film Transistors with Oxide–nitride–oxide Gate Dielectric and Multiple Nanowire Channels by Shih-Ching Chen; Ting-Chang Chang; Po-Tsun Liu; Y.C. Wu; C.C. Tsai; T.S. Chang; Chen-Hsin Lien is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Shih-Ching Chen; Ting-Chang Chang; Po-Tsun Liu; Y.C. Wu; C.C. Tsai; T.S. Chang; Chen-Hsin Lien
Publisher
Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
Published
2006
Language
EN
Field
Engineering (Physical Sciences)