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About this Materials Science article
Microwave plasma-assisted ALD of Al2O3 thin films: a study on the substrate temperature dependence of various parameters of interest by Thomas, Subin; Nalini, Savitha; Kumar, K. Rajeev is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Thomas, Subin; Nalini, Savitha; Kumar, K. Rajeev
- Publisher
- Springer; Springer-Verlag; Springer Verlag; Springer Science and Business Media LLC (ISSN 1432-0630)
- Published
- 2017
- Field
- Materials Science (Physical Sciences)
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