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About this Engineering article
Dopant redistribution during annealing of amorphized Si〈111〉 by Turan, R.; Finstad, T. G. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Turan, R.; Finstad, T. G.
- Publisher
- Taylor and Francis Group; Informa UK (Taylor & Francis); Taylor & Francis; Informa UK Limited (ISSN 0141-8610)
- Published
- 1991
- Field
- Engineering (Physical Sciences)