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About this Engineering article
The use of a high-voltage discharge at low pressure for 3D ion implantation by Vladimir I. Khvesyuk; Piotr A. Tsygankov is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Vladimir I. Khvesyuk; Piotr A. Tsygankov
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 1997
- Language
- EN
- Field
- Engineering (Physical Sciences)
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