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About this Engineering article
Plasma immersion ion implantation of SiF4 and BF3 for sub-100 nm P+/N junction fabrication by Qian, X. Y.; Cheung, N. W.; Lieberman, M. A.; Felch, S. B.; Brennan, R.; Current, M. I. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Qian, X. Y.; Cheung, N. W.; Lieberman, M. A.; Felch, S. B.; Brennan, R.; Current, M. I.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1991
- Language
- EN
- Field
- Engineering (Physical Sciences)