About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - 120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography by Lai, Kafai; Erdmann, Andreas; Ohta, Takeshi; Ishida, Keisuke; Kumazaki, Takahito; Tsushima, Hiroaki; Kurosu, Akihiko; Kakizaki, Kouji; Matsunaga, Takashi; Mizoguchi, Hakaru is a scholarly article available to read on EtoBox.

Author

Lai, Kafai; Erdmann, Andreas; Ohta, Takeshi; Ishida, Keisuke; Kumazaki, Takahito; Tsushima, Hiroaki; Kurosu, Akihiko; Kakizaki, Kouji; Matsunaga, Takashi; Mizoguchi, Hakaru

Publisher

SPIE

Published

2015

Language

EN