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What is PVD-4 Thin Film Deposition System about?

The PVD-4 is a versatile physical vapor deposition system designed for laboratory use, supporting both thermal evaporation and magnetron sputtering techniques. It features a user-friendly software for process control, fast pumping speed, and various deposition options, making it suitable for applications in biomedical, automotive, semiconductor, and more. Vinci Technologies offers a range of customizable solutions and has a strong background in manufacturing vacuum coating systems.

Author

mag.monim

Language

EN