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About this Materials Science article
Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist by Carbaugh, Daniel J; Pandya, Sneha G; Wright, Jason T; Kaya, Savas; Rahman, Faiz is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Carbaugh, Daniel J; Pandya, Sneha G; Wright, Jason T; Kaya, Savas; Rahman, Faiz
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0957-4484)
- Published
- 2017
- Field
- Materials Science (Physical Sciences)
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