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High-Pressure Sputtering of TiOx for PVs by yaokonanjeanarmand is a document available to read on EtoBox.

What is High-Pressure Sputtering of TiOx for PVs about?

This article presents the structural, optical, and electrical characterization of TiOx thin films deposited using High-Pressure Sputtering (HPS) for photovoltaic applications. The study demonstrates that the TiOx layers achieved low specific contact resistivity and high transmittance, making them suitable as electron selective contacts in solar cells. However, the minority carrier lifetime was inadequate for efficient solar cell fabrication, indicating the need for alternative passivating layers.

Author
yaokonanjeanarmand
Language
EN

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