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About this Materials Science article
Use of the direct negative Cu ion beam deposition for the control of the properties of Cu thin film by Daeil Kim is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Daeil Kim
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2006
- Language
- EN
- Field
- Materials Science (Physical Sciences)