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About this Engineering article

Cu(TiWNx) Film as a Barrierless Buffer Layer for Metallization Applications by Lin, Chon-Hsin; Chuang, Hsin-Yi; Kao, C. Robert is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Lin, Chon-Hsin; Chuang, Hsin-Yi; Kao, C. Robert
Publisher
Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
Published
2013
Field
Engineering (Physical Sciences)