Opening book details…
About this Engineering article
A Novel Low Molecular-Weight Organic Resist with High Sensitivity for Nanometer Lithography. by Kadota, Toshiaki; Kageyama, Hiroshi; Wakaya, Fujio; Gamo, Kenji; Shirota, Yasuhiko is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kadota, Toshiaki; Kageyama, Hiroshi; Wakaya, Fujio; Gamo, Kenji; Shirota, Yasuhiko
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; The Technical Association of Photopolymers, Japan; Technical Association of Photopolymers; Technical Association of Photopolymers, Japan (ISSN 0914-9244)
- Published
- 1998
- Field
- Engineering (Physical Sciences)