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Development of a Chemically Assisted Micro-beam Etching System for Three-dimensional Microanalysis by Y Tanaka; M Karashima; K Takanashi; T Sakamoto; M Owari; Y Nihei is a Materials Science article available to read on EtoBox.

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A chemically assisted micro-beam etching system for 3D microanalysis was designed. Using chemically assisted ion beam etching (CAIBE) method with FIB shave-off scanning, about several hundred micrometers clean cross-section will be acquired in a few hours. We use focused ion beam (FIB) and electron beam (EB) as micro-beams, halogen or halide mainly as reactive gases. The apparatus was manufactured based on this concept. We found that the FIB, Q-MS and SED worked as expected. The instrumentation has been completed.

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Author

Y Tanaka; M Karashima; K Takanashi; T Sakamoto; M Owari; Y Nihei

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)

Published

2003

Language

EN

Field

Materials Science (Physical Sciences)