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About this Engineering article
Measurement of adsorbed F atoms on a HF treated Si surface using infrared reflection absorption spectroscopy by Yamada, Yoshiyasu; Hattori, Tadashi; Urisu, Tsuneo; Ohshima, Hisayoshi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yamada, Yoshiyasu; Hattori, Tadashi; Urisu, Tsuneo; Ohshima, Hisayoshi
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1995
- Language
- EN
- Field
- Engineering (Physical Sciences)
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