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About this Engineering article
Electrical uniformity for Si-implanted layer of completely dislocation-free and striation-free GaAs by Hyuga, Fumiaki; Kohda, Hiroki; Nakanishi, Hideo; Kobayashi, Takashi; Hoshikawa, Keigo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hyuga, Fumiaki; Kohda, Hiroki; Nakanishi, Hideo; Kobayashi, Takashi; Hoshikawa, Keigo
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1985
- Field
- Engineering (Physical Sciences)