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<p>Thin film deposition is a broad and burgeoning field,with applications ranging from razor blade coatings to quantum-well lasers. However,much of the available thin film literature is based on empirical knowledge,and focuses only on specific processes or applications. This volume rectifies that situation,offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.</p> <h3>Booknews</h3> <p>A text on the basic principles of various thin-film vapor-phase deposition techniques, covering fundamentals and evolving topics including oil-free vacuum, microstructure control, selective CVD, and microanalysis. Discusses selection of techniques for specific applications, and shows how to predict and optimize deposition process behavior and solve production problems, with chapter exercises, a list of symbols and acronyms, and use of SI units. For graduate students in materials science, engineering, and applied physics. Annotation c.

Author

Donald Leonard Smith

Publisher

McGraw-Hill School Education Group

Published

1995

Language

EN

ISBN

9780070585027

Subjects

Engineering, Stem

Rating

4.3 / 5 (11 ratings)

Updated

2026-03-14