About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Revisit to aberration: a simulation study of lens aberration induced overlay misalignment and its experimental validation by Kim, Hoyeon; Lee, Sung-Woo; Lee, Byeongcheol; Lee, Sanghwa; Cho, Kyoungyong; Choi, Seong-Woon; Park, Chan-Hoon; Zurbrick, Larry S.; Montgomery, M. Warren is a scholarly article available to read on EtoBox.

Author

Kim, Hoyeon; Lee, Sung-Woo; Lee, Byeongcheol; Lee, Sanghwa; Cho, Kyoungyong; Choi, Seong-Woon; Park, Chan-Hoon; Zurbrick, Larry S.; Montgomery, M. Warren

Publisher

SPIE

Published

2009