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HfO 2 /Al 2 O 3 multilayer for RRAM arrays: a technique to improve tail-bit retention by Huang, Xueyao; Wu, Huaqiang; Bin Gao, ; Sekar, Deepak C; Dai, Lingjun; Kellam, Mark; Bronner, Gary; Deng, Ning; Qian, He is a Materials Science article available to read on EtoBox.

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Author
Huang, Xueyao; Wu, Huaqiang; Bin Gao, ; Sekar, Deepak C; Dai, Lingjun; Kellam, Mark; Bronner, Gary; Deng, Ning; Qian, He
Publisher
Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0957-4484)
Published
2016
Language
EN
Field
Materials Science (Physical Sciences)

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