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About this Engineering article
Hydrophobic surface treatment and interrupted atomic layer deposition for highly-resistive Al2O3 films on graphene by Jeon, Jae Ho; Jerng, Sahng-Kyoon; Akbar, Kamran; Chun, Seung-Hyun is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Jeon, Jae Ho; Jerng, Sahng-Kyoon; Akbar, Kamran; Chun, Seung-Hyun
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 1944-8244)
- Published
- 2016
- Language
- EN
- Field
- Engineering (Physical Sciences)
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