About this scholarly article

AIP Conference Proceedings [AIP PROCEEDING OF INTERNATIONAL CONFERENCE ON RECENT TRENDS IN APPLIED PHYSICS AND MATERIAL SCIENCE: RAM 2013 - Bikaner, Rajasthan, India (1–2 February 2013)] - Effect of pre-deposition annealing on the performance of MIS capacitor formed using atomic layer deposition of ultrathin HfO[sub 2] by Maurya, Savita; Singh, B. R.; Radhakrishna, M. is a scholarly article available to read on EtoBox.

Author

Maurya, Savita; Singh, B. R.; Radhakrishna, M.

Publisher

AIP

Published

2013