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About this Engineering article
Fabrication of Tantalum nitride thin film using the low vacuum magnetron sputtering system by Hashizume, Takashi; Saiki, Atsushi; Terayama, Kiyoshi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hashizume, Takashi; Saiki, Atsushi; Terayama, Kiyoshi
- Publisher
- IOP Publishing (ISSN 1757-8981)
- Published
- 2011
- Language
- EN
- Field
- Engineering (Physical Sciences)
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