About this scholarly article

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Interferometric investigation of x-ray mask fabrication distortions by Hansen, Matthew E.; Engelstad, Roxann L.; Reilly, Michael T.; Moore, Frederick T.; Patterson, David O. is a scholarly article available to read on EtoBox.

Author

Hansen, Matthew E.; Engelstad, Roxann L.; Reilly, Michael T.; Moore, Frederick T.; Patterson, David O.

Publisher

SPIE

Published

1994