About this scholarly article

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - A new monocyclic fluropolymer structure for 157-nm photoresists by Takebe, Yoko; Sturtevant, John L.; Eda, Masataka; Okada, Shinji; Yokokoji, Osamu; Irie, Shigeo; Otoguro, Akihiko; Fujii, Kiyoshi; Itani, Toshiro is a scholarly article available to read on EtoBox.

Author

Takebe, Yoko; Sturtevant, John L.; Eda, Masataka; Okada, Shinji; Yokokoji, Osamu; Irie, Shigeo; Otoguro, Akihiko; Fujii, Kiyoshi; Itani, Toshiro

Publisher

SPIE

Published

2004

Language

EN