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Can I read Diamond Immersion Photodetector for 193 nm Lithography on EtoBox?
Diamond Immersion Photodetector for 193 nm Lithography by Lu Cheng; Zhao Wang; Wei Zheng is a Engineering article available to read on EtoBox.
What is Diamond Immersion Photodetector for 193 nm Lithography about?
## Abstract At present, most photodetectors work in atmospheric or vacuum environments, which leaves a large gap for detection under liquid conditions. However, this kind of research is of great significance, especially for the monitoring of 193 nm vacuum UV (VUV) light in the immersion lithography system underwater. Here, the p‐type diamond single crystal (PDSC) is applied as the photoelectrode for the construction of a VUV immersion photodetector with a PDSC‐ultra‐pure water‐Pt structure and a high response to 193 nm light. Under 193 nm excitation (@8 μW) and at 0 V, the PDSC immersion photodetector demonstrates a favorable characteristic of having a high responsivity of 5 mA·W^−1^. Due to its exceptional performance, this device has been proven to function as a highly‐sensitive and self‐powered VUV detector, with significant potential for utilization in the monitoring of 193 nm light in immersion lithography systems.
Who reads Diamond Immersion Photodetector for 193 nm Lithography?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Lu Cheng; Zhao Wang; Wei Zheng
- Publisher
- Wiley
- Published
- 2023
- Language
- EN
- Field
- Engineering (Physical Sciences)